aet-four-puit-2000c

Pit furnace 2000°C

Our engineering expertise in heating, atmosphere management, vacuum management, mechanical transfers, automation and regulation enables us to provide you with a solution that is perfectly adapted to your needs.
We adapt to your expectations by providing you with numerous solutions for research laboratories or industrial production.

All our equipment is CE compliant and is manufactured with materials that comply with current legislation.

 

 

Caractéristiques
Options
Caractéristiques (Fr) Specifications (Eng)

Atmosphère de travail

Process

Atmosphère contrôlée

Vide

Controlled atmosphere

vacuum

Type de four

Type of furnace

Four étanche

Sealed furnace 

Sens du four

Orientation furnace

Horizontal ou vertical

Horizontal or vertical

Pression de travail possible

Possible operating pressure

pression atmosphérique ou

régulation de pression < à la pression atmosphérique ou

vide

atmospheric pressure

pressure regulation < atmospheric pressure

vacuum

Application

Application

Traitement thermique : Recuit, frittage, graphitisation…

Heat treatment : Rapid Thermal Process, sintering, graphitization…

Température Maximale

Maximum temperature

Jusqu’à 2400°C
Up to 2400°C

Isolation thermique

Thermal insulation

Graphite

Graphite

Type d’élément chauffant

Heating element type

Graphite

Graphite

Régulation et Mesure de la température

Temperature Control and Measurement

Thermocouple et Pyromètre Optique

Thermocouple and Optical Pyrometer

Régulateur programmateur classe 0.1

Programmable controller class 0.1
Zone utile min-max de la gamme
Min-max useful area of the range

Ø 80 – 500mm

h 100 -1100mm

Ø 80 – 500mm

h 100 -1100mm

Caractéristiques (Fr) Specifications (Eng)

Gaz process

Gaz process

neutre, hydrogéné, autres selon besoin

oxidizing, neutral, hydrogenated, further gas as needed

Niveau de vide

Vacuum level

Primaire ou secondaire

Medium or High

Multiprogramme + enregistreur

Multiprogram + recorder

Supervision

Monitoring

IHM sur pc standard

HCI on standard PC

Examples

 

Pit furnace 2000°C

 

Atmosphère de travail

Process

Atmosphère contrôlée

Vide

Controlled atmosphere

vacuum

Pression

Pressure

Partielle Partial
Température Maximale

Maximum temperature

2000°C 2000°C
Vitesse de montée maximale

Maximum temperature rise speed

30°C/min 30°C/min
Homogénéité Thermique

Thermal homogeneity

< ±5°C < ±5°C
Dimension zone utile (Ø x H mm)

Size of useful area (Ø x H mm)

80 x 100 80 x 100
aet-four-puit-2000c

The group

 

We are able to offer our clients an end-to-end approach thanks to our technical skills and the experience of our teams.

A 360° value proposition in thermal equipment for research laboratories and industry

 

Standard equipment solutions for laboratories and industry

 

A unique and advanced technological solution dedicated to the oxidation phase involved in the manufacture of VCSELs

 

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Contact our team

 

Get precise information about our services.